硝子基板・シリコンウェハー基板の洗浄・エッチング・剥離の島村ビーム

Dummy wafer sales and dummy glass processing Shimamura of peeling beam etching of silicon substrate wafer cleaning glass substrate

About substrate regeneration washing
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About substrate regeneration washing

About substrate regeneration washing

The substrate regeneration washing is the work that exfoliates film coating on substrates of
semiconductor silicon wafer, liquid crystal color filter or glass.

We regenerate defects in the progress of the work in factory as follows.

・The parts which are used by warming up when machines are started working in factory.
・The defects which are born of production line.
・The parts which are used to use up chemicals left in the machines when factory shuts down.

The substrate regeneration washing is done as the items mentioned above.
We send article of substrate through high quality exfoliation and washing by substantial equipment
and knowledge cultivating more than 20years.

About substrate regeneration washing

Immerse the various solutions

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    In performing the cleaning of the substrate received your request to enter the work immersed in chemical cleaning is required.

Washed with various devices

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    Depending on the substrate using the facilities who request. Using the various devices, will continue to work cleaning.

Washed with water

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    The sink with water, the substrate which had been taken from various devices.

Washed with water

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    Rinse with pure water shed further the substrate with water.

Formal name of substrate washing is deposition exfoliation

About deposition

Deposition is used by painting on steel plate as protection from rust. However, nowadays deposition is also used to liquid crystal, silicon wafer by chemical vapor deposition system, sputtering system or vacuum evaporation system which form one or plural film coatings (deposition) on.

About exfoliation

The above-mentioned items about deposition,

1 there are some failures in production process. That is to say, defect rate.If the substrates are expensive, it is a help for you as lower production cost and zero emission to exfoliate film coatings on substrates and to use that substrates in production process again.The meaning of expensive the substrate is not only to be high cost the material, but also to be high valued added until becoming substrate. For example, polishing to form substrate is that.

2. It has a need to clean and reuse the equipment because deposition materials are flying to equipment.
This is also exfoliation

To happen the need of exfoliation,

1.It needs to be expensive substrate,
2.It needs to be able to reuse in production line.

And to reward to the demand of exfoliation,It needs to exfoliate deposition completely, not to hurt the substrate, to be able to check out whether deposition is exfoliated completely or not.

In our company

When deposition is made mentioned above, we have been studying for respond the requests 1 and 2 with chemical processing.
Introduction of our technology guide

1:Glass substrate with a color filter
2:Glass substrate with a multilayer oxide film
3:The polycrystalline silicon substrate wafer, Ⅰ above
4:SUS electrode plate for CVD,
5:Wafers for processing Rimeruto

Separation process is made up of more than meet the requirements, such as this.